RF Plasma Generator

FEATURES

• Optimal adjustment to process
• Maximum efficiency and Flexibility
• Closed loop control through the measurement of the RF signal directly at the input and output of the matchbox.

Applications

Ideal for use in Plasma screen manufacturing, Solar cell Industry and Semi-conductor production in processes such as:

• Reactive Ion Etching (RIE)
• Atomic Layer Deposition (ALD)
• Plasma Enhanced Chemical Vapor Deposition (PECVD)
• RF Sputtering